Substrate size: corresponds to the substrate size up to about G10.
Rapid temperature rise and fall: rapid heating up to 100 degrees Celsius.
We can reach a short time (less than 100ppm) in our original chamber design to reduce the process time.
Temperature distribution: the heater placed on the top and bottom of the heater is also zone controlled.
Cleanliness: class 10.
Air conditioning control: air control inside our chamber (exhaust gas laminar flow) ensures that exhaust gas is exhausted from the chamber.
Substrate holder: substrate holding is designed to keep the heat-treated glass substrate properly and to prevent damage.
